This inventor holds 1 USPTO granted patent. Top assignee: Helmholtz-Zentrum Hereon Gmbh. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Kirti Sankhala - Innovator in Membrane Technology
Introduction
Kirti Sankhala is a prominent inventor based in Geesthacht, Germany. She has made significant contributions to the field of membrane technology, particularly through her innovative methods for preparing composite membranes. Her work is characterized by a focus on creating efficient and effective filtration systems.
Latest Patents
Kirti Sankhala holds a patent for a "Method for preparing isoporous hollow fiber composite membranes." This invention provides a coated hollow fiber membrane that features an isoporous inner skin and a porous outer support membrane. The method involves a series of steps, including coating the inner surface of a hollow fiber support membrane with a polymer solution and utilizing a core gas stream to enhance the membrane's properties. The membranes developed through this method are particularly useful for microfiltration, ultrafiltration, and nano-filtration applications.
Career Highlights
Kirti Sankhala is currently associated with Helmholtz-Zentrum Hereon GmbH, where she continues to advance her research in membrane technology. Her innovative approach has led to the development of membranes that are not only efficient but also maintain their porosity during the coating process. This has significant implications for various filtration applications.
Collaborations
Throughout her career, Kirti has collaborated with esteemed colleagues such as Volker Abetz and Joachim Koll. These collaborations have further enriched her research and contributed to the advancement of membrane technology.
Conclusion
Kirti Sankhala is a trailblazer in the field of membrane technology, with her innovative methods paving the way for more efficient filtration systems. Her contributions are vital to the ongoing development of advanced materials in this area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile