Winchester Center, CT, United States of America

Kirk A Middlemass


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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3 patents (USPTO):Explore Patents

Title: Kirk A Middlemass: Innovator in Light Exposure Technology

Introduction

Kirk A Middlemass is a notable inventor based in Winchester Center, Connecticut. He has made significant contributions to the field of light exposure technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is an "Exposure device having an array of light emitting diodes." This device and method are designed for exposing light-sensitive substrates to a concentrated light source. It is particularly suitable for curing substances such as photosensitive inks, adhesives, and photographic elements. The device emits ultraviolet or visible light from an array of LEDs, which is then directed by light guides to a light concentrator. This concentrator emits concentrated light to a photosensitive target for exposure. Another significant patent is the "Light guide exposure device." This invention comprises light-emitting diodes arranged in a single array, defining an array width, and a flexible light guide. The design ensures that all light from the array is directed to the proximal end of the light guide without any optical elements that could decrease light intensity.

Career Highlights

Kirk A Middlemass is currently associated with Dymax Corporation, where he continues to develop innovative solutions in light exposure technology. His work has been instrumental in advancing the capabilities of light-sensitive applications.

Collaborations

Throughout his career, Kirk has collaborated with talented individuals such as Todd J Hallock and Stephan J W Platzer. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Kirk A Middlemass stands out as a prominent inventor in the field of light exposure technology. His patents reflect his commitment to innovation and his ability to address complex challenges in the industry.

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