Warsaw, Poland

Kinga Leszczynska

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Evonik Degussa Gmbh. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kinga Leszczynska. Retrieved from https://idiyas.com/inventor/kinga-leszczynska

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Kinga Leszczynska: Innovator in Polyhedral Oligomeric Silsesquioxane Technology

Introduction

Kinga Leszczynska is a prominent inventor based in Warsaw, Poland. She has made significant contributions to the field of materials science, particularly through her innovative work with polyhedral oligomeric silsesquioxanes (POSS). Her research and inventions have garnered attention for their potential applications in various industries.

Latest Patents

Kinga holds a patent for her invention titled "Polyhedral oligomeric silsesquioxane (POSS)-linked ligands." This patent describes a unique ligand structure represented by the general formula (I)L[(R)(SiO)R][(R)SiO)R][(R)SiO)R]. This innovation showcases her expertise in developing advanced materials that can enhance the performance of various chemical compounds.

Career Highlights

Kinga is currently employed at Evonik Degussa GmbH, a leading company in specialty chemicals. Her role at the company allows her to further explore her research interests and apply her inventions in practical settings. With her dedication and innovative mindset, she has become a valuable asset to her team and the industry.

Collaborations

Kinga has collaborated with notable colleagues, including Anna Wojtasiewicz and Dorit Wolf. These partnerships have enabled her to expand her research and contribute to the development of new technologies in her field.

Conclusion

Kinga Leszczynska's work in polyhedral oligomeric silsesquioxanes represents a significant advancement in materials science. Her innovative spirit and dedication to research continue to inspire others in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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