Troy, NY, United States of America

King C Sheng

This inventor holds 1 USPTO granted patent. Top assignees: Akzo Nobel N.v., Northwestern University. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: King C Sheng. Retrieved from https://idiyas.com/inventor/king-c-sheng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: King C Sheng: Innovator in Laser Direct Writing Technology

Introduction

King C Sheng is a notable inventor based in Troy, NY (US). He has made significant contributions to the field of technology, particularly in the area of laser direct writing. His innovative approach has led to advancements in the application of conductive materials on dielectric substrates.

Latest Patents

King C Sheng holds a patent for a method titled "Laser direct writing." This patent describes a process for providing a conductive metal deposit on the surface of a dielectric substrate. The method involves applying a composition that includes a mixture of a salt and an amine or amide compound to the substrate. This composition is then subjected to a continuous wavelength laser beam, resulting in a precise and efficient deposition of conductive materials.

Career Highlights

Throughout his career, King C Sheng has worked with prominent organizations, including Akzo Nobel N.V. and Northwestern University. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

King C Sheng has collaborated with notable individuals such as Anthony J Castro and Richard P Van Duyne. These partnerships have further enhanced his work and expanded the impact of his innovations.

Conclusion

King C Sheng's contributions to laser direct writing technology exemplify his dedication to innovation and advancement in the field. His work continues to influence the development of new materials and methods in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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