This inventor holds 1 USPTO granted patent. Top assignee: Nano and Advanced Materials Institute Limited. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Kin Cheung Chan: Innovator in Photopolymer Technology
Introduction
Kin Cheung Chan is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of photopolymer technology, particularly in applications that require high resistance to yellowing and thermal cracking. His innovative work has led to the development of a unique acrylate-based photopolymer that showcases remarkable properties.
Latest Patents
Kin Cheung Chan holds a patent for a photopolymer designed for anti-yellowing and anti-thermal cracking applications. This advanced material exhibits high yellowing resistance, excellent photo sensitivity, high toughness, and a high glass transition temperature. The patent details methods of preparation and usage, as well as solders that incorporate this innovative photopolymer. He has 1 patent to his name.
Career Highlights
Chan is associated with the Nano and Advanced Materials Institute Limited, where he continues to push the boundaries of material science. His work at this institute has positioned him as a key player in the development of advanced materials that meet the demands of modern technology.
Collaborations
Throughout his career, Chan has collaborated with notable colleagues, including Liang Zhang and Chun Kwong Yeung. These partnerships have fostered an environment of innovation and creativity, leading to groundbreaking advancements in their respective fields.
Conclusion
Kin Cheung Chan's contributions to photopolymer technology exemplify the spirit of innovation. His work not only enhances material properties but also paves the way for future advancements in the industry.