Company Filing History:
Years Active: 2015
Title: Kimsam Hsieh: Innovator in Crystalline Silicon Technology
Introduction
Kimsam Hsieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of silicon technology, particularly in the formation of crystalline silicon. His innovative approaches have the potential to enhance the quality and efficiency of silicon production.
Latest Patents
Kimsam Hsieh holds a patent for a "Crystalline silicon formation apparatus." This invention utilizes a quick cooling method applied to the bottom of a crucible. This technique controls the growth orientation of polycrystalline silicon grains, allowing for the formation of twin boundaries. The symmetric grain boundaries help in solidifying and growing the crystal grain in a unidirectional manner, minimizing the formation of defects or impurities in the polycrystalline silicon.
Career Highlights
Hsieh is currently employed at Sino-American Silicon Products Inc., where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the production processes within the silicon industry.
Collaborations
Kimsam Hsieh collaborates with talented individuals such as Chung-Wen Lan and Wen-Huai Yu. Their combined expertise contributes to the ongoing success and innovation at Sino-American Silicon Products Inc.
Conclusion
Kimsam Hsieh's contributions to crystalline silicon technology exemplify the impact of innovative thinking in the field. His patent and ongoing work at Sino-American Silicon Products Inc. highlight the importance of advancements in silicon production.