Tokyo, Japan

Kimio Nishitani

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kimio Nishitani. Retrieved from https://idiyas.com/inventor/kimio-nishitani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Kimio Nishitani: Innovator in Ink Jet Technology

Introduction

Kimio Nishitani is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of ink jet technology. With a focus on enhancing recording apparatus, Nishitani has made significant strides in the industry.

Latest Patents

Nishitani holds a patent for an ink jet recording apparatus. This innovative device includes a recording head that ejects recording liquid to perform recording operations on a recording medium. It also features a laser source that projects a laser beam onto the recording medium, along with a control device that responds to a record signal supplied to the recording head. This technology aims to improve the efficiency and quality of ink jet printing.

Career Highlights

Throughout his career, Kimio Nishitani has been associated with Canon Inc., a leading company in imaging and printing solutions. His work has contributed to the advancement of ink jet technology, making it more accessible and efficient for various applications.

Collaborations

Nishitani has collaborated with notable colleagues, including Kyoko Fukushima and Jiro Moriyama. Their combined expertise has fostered innovation within the company and the industry.

Conclusion

Kimio Nishitani's contributions to ink jet technology exemplify the impact of innovative thinking in the field of printing. His patent and work at Canon Inc. continue to influence the industry, showcasing the importance of advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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