Kimiko Mashimo

Title: Kimiko Mashimo: Innovator in Dry Etching Technology

Introduction

Kimiko Mashimo is a notable inventor based in Fuchu, Japan. She has made significant contributions to the field of materials science, particularly in the development of masking materials for dry etching processes. Her innovative work has implications for the production of thin magnetic films, which are essential in various technological applications.

Latest Patents

Kimiko Mashimo holds one patent titled "Masking material for dry etching." The objective of this invention is to provide a masking material that is suitable for fine processing of magnetic films as thin as a few nanometers, such as NiFe or CoFe, which are components of TMR films. This invention simplifies the process of producing TMR elements and reduces production costs associated with facilities and materials. The solution involves using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, combined with a metal that has a melting or boiling point that increases upon conversion into a nitride or carbide.

Career Highlights

Throughout her career, Kimiko has worked with prestigious organizations, including the National Institute for Materials Science and Japan Science and Technology Corporation. Her work in these institutions has allowed her to advance her research and contribute to the field of materials science significantly.

Collaborations

Kimiko has collaborated with esteemed colleagues, including Isao Nakatani and Naoko Matsui. These collaborations have enriched her research and fostered innovation in her projects.

Conclusion

Kimiko Mashimo's contributions to the field of dry etching technology highlight her role as an innovator in materials science. Her patent for a masking material demonstrates her commitment to advancing technology and reducing production costs in the industry.