Kimiaki Fujino

Title: Kimiaki Fujino: Innovator in Substrate Technology

Introduction

Kimiaki Fujino is a notable inventor based in Kashihara, Japan. He has made significant contributions to the field of substrate technology, particularly in the development of methods for creating substrates with buried structures. His innovative approaches have led to the filing of multiple patents, showcasing his expertise and creativity in this area.

Latest Patents

Kimiaki Fujino holds 2 patents that focus on methods of making substrates with buried structures and the fabrication of display devices that incorporate these substrates. One of his latest patents describes a method that involves preparing a glass substrate with a principal surface, forming a groove on this surface through a wet etching process, and depositing a first material to fill the groove. This results in a buried structure that is flush with the principal surface. The etching process utilizes an etchant that includes hydrofluoric acid, ammonium fluoride, and either hydrochloric acid or oxalic acid.

Career Highlights

Throughout his career, Kimiaki Fujino has worked with prominent companies, including Sharp Kabushiki Kaisha Corporation. His work has been instrumental in advancing substrate technology, particularly in applications related to display devices.

Collaborations

Kimiaki has collaborated with notable colleagues such as Kazuki Kobayashi and Ikuo Sakono. These collaborations have contributed to the development of innovative solutions in the field of substrate technology.

Conclusion

Kimiaki Fujino's contributions to substrate technology and his innovative patents highlight his role as a significant inventor in this field. His work continues to influence advancements in display device fabrication and substrate design.