Kimberly A Ruben

Title: The Innovations of Kimberly A. Ruben

Introduction

Kimberly A. Ruben is a notable inventor based in St. James, Missouri, recognized for her contributions to the field of microelectronics. With a total of two patents to her name, she has made significant advancements in protective coatings used in semiconductor and MEMS device production.

Latest Patents

Ruben's latest patents focus on spin-on protective coatings for wet-etch processing of microelectronic substrates. These innovative protective coating layers are designed for use in wet etch processes during the production of semiconductor and MEMS devices. The layers consist of a primer layer, a first protective layer, and an optional second protective layer. The primer layer is composed of an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers made from styrene, acrylonitrile, and potentially other addition-polymerizable monomers such as (meth)acrylate monomers, vinylbenzyl chloride, and diesters of maleic acid or fumaric acid. The second protective layer is made up of a highly halogenated polymer, such as a chlorinated polymer, which may or may not be crosslinked upon heating.

Career Highlights

Kimberly A. Ruben has established herself as a key figure in her field through her work at Brewer Science, Inc. Her expertise in developing advanced materials has contributed to the company's reputation for innovation in microelectronics.

Collaborations

Ruben has collaborated with notable colleagues, including Chenghong Li and Tony D. Flaim, to further enhance the research and development of protective coatings.

Conclusion

Kimberly A. Ruben's work exemplifies the spirit of innovation in the microelectronics industry. Her patents and collaborations highlight her commitment to advancing technology in this critical field.