This inventor holds 1 USPTO granted patent. Top assignee: Midwest Research Institute. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Kim M Jones: Innovator in Epitaxial Growth Technology
Introduction
Kim M Jones is a notable inventor based in Arvada, Colorado. She has made significant contributions to the field of materials science, particularly in the area of epitaxial growth processes. Her innovative work has led to the development of a patented technology that enhances the efficiency of layer deposition on crystalline substrates.
Latest Patents
Kim M Jones holds a patent for her invention titled "Rapid low-temperature epitaxial growth using a hot-element assisted chemical vapor deposition process." This invention provides a process for depositing an epitaxial layer on a crystalline substrate. The process involves several steps, including providing a chamber with a heating element, introducing the substrate into the chamber, heating the element to a temperature sufficient to decompose a source gas, and passing the source gas in contact with the element to form an epitaxial layer on the substrate. This innovative approach has the potential to improve the quality and efficiency of semiconductor manufacturing.
Career Highlights
Kim M Jones is associated with the Midwest Research Institute, where she has been able to apply her expertise in materials science. Her work at the institute has allowed her to collaborate with other professionals in the field and contribute to advancements in technology.
Collaborations
Throughout her career, Kim has worked alongside esteemed colleagues such as Eugene Iwancizko and Richard S Crandall. These collaborations have fostered an environment of innovation and have led to further developments in the field of epitaxial growth.
Conclusion
Kim M Jones is a pioneering inventor whose work in epitaxial growth technology has made a significant impact on the field of materials science. Her patented process demonstrates her commitment to advancing technology and improving manufacturing techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
