Cranston, RI, United States of America

Kilbnam Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Technic, Inc.. Active years: 2007.


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Kilbnam Hwang: Innovator in Electroplating Technology

Introduction

Kilbnam Hwang is a notable inventor based in Cranston, RI (US). He has made significant contributions to the field of electroplating through his innovative methods. His work focuses on enhancing the electroplatability of metal surfaces, which is crucial for various industrial applications.

Latest Patents

Kilbnam Hwang holds a patent for a "Near neutral pH cleaning/activation process to reduce surface oxides on metal surfaces prior to electroplating." This invention relates to a method for electroplating a metal deposit on composite articles that have both electroplatable and non-electroplatable portions. The method improves the electroplatability of the articles by treating them with a near neutral pH solution containing a conductivity agent and a buffer. This process effectively reduces or removes surface oxides and contaminants without adversely affecting the non-electroplatable portions. As a result, a uniform and smooth metal deposit is achieved during the plating process.

Career Highlights

Kilbnam Hwang has dedicated his career to advancing electroplating technologies. His innovative approach has led to improved methods that benefit various industries. His work is recognized for its practical applications and contributions to manufacturing processes.

Collaborations

Kilbnam has collaborated with Robert A Schetty, III, who is also involved in the field of electroplating. Their partnership has fostered advancements in the technology and application of electroplating methods.

Conclusion

Kilbnam Hwang's contributions to electroplating technology demonstrate his commitment to innovation and improvement in manufacturing processes. His patent reflects a significant advancement in the field, showcasing the importance of enhancing electroplatability for industrial applications.

Profile summary based on public USPTO records.
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