Kiichi Ishikawa

Title: Kiichi Ishikawa: Innovator in Imaging Technology

Introduction

Kiichi Ishikawa is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of imaging technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of Kiichi Ishikawa's latest patents is an imaging device that includes a first chip, a support substrate, and a second chip. The support substrate features an excavated portion that is opposed to the first chip, which can take the shape of a recess or a hole. The second chip is positioned within this excavated portion and is electrically coupled to the first chip. Notably, at least one of these chips possesses a photoelectric conversion function. Another significant patent involves a mask inspection method, a mask defect inspection system, and a method for producing masks. This method is designed to detect pattern defects in a mask used for transferring predetermined patterns. It includes steps for presetting different acceptable defect sizes based on various conditions, detecting defects, and determining whether a defect requires repair.

Career Highlights

Throughout his career, Kiichi Ishikawa has worked with prominent companies such as Sony Corporation and Sony Semiconductor Solutions Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in imaging.

Collaborations

Kiichi Ishikawa has collaborated with notable professionals in his field, including Hidenobu Tsugawa and Ryoichi Nakamura. These collaborations have likely enriched his work and led to advancements in imaging technology.

Conclusion

Kiichi Ishikawa's contributions to imaging technology through his patents and career achievements highlight his role as an influential inventor. His work continues to impact the field, showcasing the importance of innovation in technology.