Changwon, South Korea

Kihyun Nam

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Em-Tech, Inc., Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kihyun Nam. Retrieved from https://idiyas.com/inventor/kihyun-nam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kihyun Nam: Innovator in Wearable Technology

Introduction

Kihyun Nam is a notable inventor based in Changwon, South Korea. He has made significant contributions to the field of wearable technology, particularly with his innovative designs that enhance user experience.

Latest Patents

Kihyun Nam holds a patent for a wearable device that includes a speaker frame with a vent hole. This device features a housing that forms an inner space and includes a speaker hole. Inside the housing, there is a speaker assembly and a sound duct that extends from the inner surface to the speaker assembly. The speaker assembly consists of a frame with multiple openings and a flow path that connects them, ensuring optimal sound quality.

Career Highlights

Throughout his career, Kihyun Nam has worked with prominent companies such as Samsung Electronics Ltd. and Em-Tech, Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technology in the wearable sector.

Collaborations

Kihyun Nam has collaborated with talented individuals like Joonrae Cho and Hyunwoo Jeong. These partnerships have fostered innovation and creativity in his projects.

Conclusion

Kihyun Nam is a distinguished inventor whose work in wearable technology continues to influence the industry. His patent for a wearable device showcases his commitment to enhancing user experience through innovative design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…