Suwon, South Korea

Kibong Nam

This inventor holds 1 USPTO granted patent. Top assignees: Samsung Electronics Co., Ltd., Sungkyunkwan University. Active years: 2021.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Kibong Nam: Innovator in Photomask Assembly Technology

Introduction

Kibong Nam is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of photomask assembly technology. His innovative methods have paved the way for advancements in manufacturing processes.

Latest Patents

Kibong Nam holds a patent for "Methods of manufacturing pellicle assembly and photomask assembly." This patent describes methods that include forming a sublimable support layer on a first surface of a pellicle membrane. It also involves attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface. The process culminates in sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. Additionally, the patent outlines how a photomask is fixed to the pellicle frame, ensuring that the photomask faces the pellicle membrane with the pellicle frame in between.

Career Highlights

Throughout his career, Kibong Nam has worked with prominent organizations such as Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these institutions has contributed to his expertise in the field of photomask technology.

Collaborations

Kibong Nam has collaborated with talented individuals, including Mun Ja Kim and Seulgi Kim. Their joint efforts have further enhanced the development of innovative technologies in their respective fields.

Conclusion

Kibong Nam's contributions to photomask assembly technology demonstrate his innovative spirit and dedication to advancing manufacturing processes. His patent and collaborations reflect his commitment to excellence in the field.

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