Siheung, South Korea

Ki Taek Lee

This inventor holds 1 USPTO granted patent. Top assignee: Dongjin Semichem Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ki Taek Lee. Retrieved from https://idiyas.com/inventor/ki-taek-lee-4wce1slb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ki Taek Lee: Innovator in Hard Coating Technology

Introduction

Ki Taek Lee is a notable inventor based in Siheung, South Korea. He has made significant contributions to the field of materials science, particularly in the development of hard coating technologies. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Ki Taek Lee holds a patent for a "Composition for forming hard coating layer, hard coating layer using the composition, and laminate comprising the hard coating layer." This invention discloses a composition that is easy to mold and includes a hard coating resin, a photoinitiator, a thermal initiator, and a solvent. The weight ratio of the photoinitiator to the thermal initiator ranges from 1:50 to 10:1, which enhances the performance of the hard coating layer.

Career Highlights

Ki Taek Lee is currently employed at Dongjin Semichem Co., Ltd., where he continues to innovate and develop new materials. His work at the company has positioned him as a key player in the advancement of hard coating technologies.

Collaborations

Some of his notable coworkers include Eun Soo Shin and Sung Il Kim, who contribute to the collaborative environment that fosters innovation at Dongjin Semichem Co., Ltd.

Conclusion

Ki Taek Lee's contributions to hard coating technology exemplify the spirit of innovation in the materials science field. His patent reflects a commitment to advancing technology and improving product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…