Hwaseong, South Korea

Ki Ryong Choi

This inventor holds 1 USPTO granted patent. Top assignees: Samsung Electronics Co., Ltd., Semes Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ki Ryong Choi. Retrieved from https://idiyas.com/inventor/ki-ryong-choi-onej8nom

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2019

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ki Ryong Choi: Innovator in Substrate Treatment Technology

Introduction

Ki Ryong Choi is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus designed to enhance the efficiency of substrate processing.

Latest Patents

Ki Ryong Choi holds a patent for an "Apparatus for treating substrate." This substrate-treating apparatus includes a vessel that provides a treatment space, a substrate-supporting unit to hold the substrate, and a spraying member that applies treatment solution onto the substrate. The vessel features an inner side surface with at least one texture pattern, which contributes to the effectiveness of the treatment process. He has 1 patent to his name.

Career Highlights

Throughout his career, Ki Ryong Choi has worked with prominent companies in the technology sector. He has been associated with Semes Co., Ltd. and Samsung Electronics Co., Ltd., where he has contributed to various innovative projects and advancements in technology.

Collaborations

Ki Ryong Choi has collaborated with talented individuals in his field, including coworkers Gil Hun Song and Young Chol Choi. Their combined expertise has likely fostered a creative environment that encourages innovation and development.

Conclusion

Ki Ryong Choi is a distinguished inventor whose work in substrate treatment technology has made a significant impact. His patent and collaborations reflect his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…