Suwon, South Korea

Ki-Hyun Pakr

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ki-Hyun Pakr. Retrieved from https://idiyas.com/inventor/ki-hyun-pakr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Ki-Hyun Pakr: Innovator in Electronic Device Protection

Introduction

Ki-Hyun Pakr is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of electronic device protection through his innovative designs. His work is particularly recognized for enhancing the safety and usability of electronic devices.

Latest Patents

Ki-Hyun Pakr holds a patent for a protection cover designed to safeguard electronic devices. This invention includes a cover unit that envelops the device and a suction unit integrated into the cover for securing the device in place. The protection cover can be implemented in various ways, showcasing the versatility of his design.

Career Highlights

Pakr is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His role at Samsung allows him to work on cutting-edge innovations that impact millions of users worldwide. His dedication to improving electronic device safety is evident in his patent work.

Collaborations

One of his notable coworkers is Jong-Hyun Park, with whom he collaborates on various projects within the company. Their teamwork contributes to the development of innovative solutions in the electronics industry.

Conclusion

Ki-Hyun Pakr's contributions to electronic device protection through his patent demonstrate his commitment to innovation. His work at Samsung Electronics Co., Ltd. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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