Ki Ho Balk

Title: Ki Ho Balk: Innovator in Photoresist Technology

Introduction

Ki Ho Balk is a notable inventor based in Ichon-shi, South Korea. He has made significant contributions to the field of photoresist technology, which is essential in the semiconductor industry. His innovative work has led to the development of a unique cross-linking monomer that enhances the performance of photoresist polymers.

Latest Patents

Ki Ho Balk holds a patent for "Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same." This invention discloses a cross-linking monomer represented by a specific chemical formula. The patent outlines a process for preparing photoresist polymers using this monomer, which includes various chemical groups that enhance the properties of the photoresist.

Career Highlights

Ki Ho Balk is currently employed at Hynix Semiconductor Inc., where he applies his expertise in semiconductor materials. His work focuses on improving the efficiency and effectiveness of photoresist materials used in the manufacturing of integrated circuits. His contributions have been instrumental in advancing the technology used in modern electronics.

Collaborations

Ki Ho Balk has collaborated with notable colleagues, including Jae Chang Jung and Keun Kyu Kong. These collaborations have fostered innovation and have led to advancements in the field of semiconductor technology.

Conclusion

Ki Ho Balk is a prominent figure in the realm of photoresist technology, with a patent that showcases his innovative approach to enhancing semiconductor materials. His work at Hynix Semiconductor Inc. and collaborations with fellow inventors highlight his commitment to advancing technology in the semiconductor industry.