The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
Feb. 22, 2002
Jae Chang Jung, Ichon-shi, KR;
Keun Kyu Kong, Ichon-shi, KR;
Min Ho Jung, Ichon-shi, KR;
Geun Su Lee, Ichon-shi, KR;
Ki Ho Balk, Ichon-shi, KR;
Jae Chang Jung, Ichon-shi, KR;
Keun Kyu Kong, Ichon-shi, KR;
Min Ho Jung, Ichon-shi, KR;
Geun Su Lee, Ichon-shi, KR;
Ki Ho Balk, Ichon-shi, KR;
Hynix Semiconductor Inc., , KR;
Abstract
The present invention discloses a cross-linking monomer represented by the following Chemical Formula 1, a process for preparing a photoresist polymer using the same, and said photoresist polymer: wherein, R' and R″ individually represent hydrogen or methyl; m represents a number of 1 to 10; and R is selected from the group consisting of straight or branched Calkyl, straight or branched Cester, straight or branched Cketone, straight or branched Ccarboxylic acid, straight or branched Cacetal, straight or branched Calkyl including at least one hydroxyl group, straight or branched Cester including at least one hydroxyl group, straight or branched Cketone including at least one hydroxyl group, straight or branched Ccarboxylic acid including at least one hydroxyl group, and straight or branched Cacetal including at least one hydroxyl group.