Ki Dae Kim

Title: Ki Dae Kim and His Photoresist Polymer Patent.

Introduction

Ki Dae Kim is an inventor associated with Taejon, South Korea, and Korea Kumho Petrochemical Co., Ltd. His patent work concerns materials for chemically amplified positive photoresists, which are used in photolithographic processes.

Latest Patents

The available information identifies one patent for Kim: “Polymer for Chemical Amplified Positive Photoresist Composition.” It describes a positive photoresist composition containing a matrix resin made from a polymer with specified repeating units and a photoacid generator. The polymer has a polystyrene-reduced weight-average molecular weight of approximately 2,000 to 1,000,000.

The composition is alkali-developable and is described as offering sensitivity, resolution, and deep-ultraviolet transmissivity, along with good storage stability. Its polymer structure allows specified substituents, including hydrogen, methyl, ethyl, tert-butyl, tetrahydropyranyl, and alkoxymethylene groups. The patent also identifies tert-butyl, tetrahydropyranyl, and alkoxymethylene groups as possible acid-labile protective groups. Kim’s listed patent count is 1 patent.

Career Highlights

Kim’s documented patent contribution focuses on polymer chemistry for photoresist formulations. The invention addresses material properties relevant to photolithography, including developability, sensitivity, resolution, optical transmission, and storage stability.

Collaborations

The supplied information lists Joo Hyeon Park and Seong Ju Kim as Kim’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.

Conclusion

Ki Dae Kim’s recorded patent reflects work on chemically amplified positive photoresist polymers, with an emphasis on performance and stability for deep-ultraviolet lithographic applications.