Austin, TX, United States of America

Khaled Lakhdhar

This inventor holds 1 USPTO granted patent. Top assignee: Cirrus Logic Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Khaled Lakhdhar. Retrieved from https://idiyas.com/inventor/khaled-lakhdhar-n5ptjtqp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Khaled Lakhdhar: Innovator in Biometric Technology

Introduction

Khaled Lakhdhar is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of biometric technology, particularly through his innovative patent. His work focuses on enhancing the accuracy and efficiency of biometric processes.

Latest Patents

Khaled Lakhdhar holds a patent for "Biometric processes, apparatus and machine-readable mediums." This invention involves a biometric processor that utilizes ear biometric data from both ears of a user. The processor performs a biometric algorithm to compare the acquired data against stored templates, generating an overall biometric score based on weighted scores from both ears. This technology aims to improve the reliability of biometric identification systems.

Career Highlights

Khaled is currently employed at Cirrus Logic Inc., where he continues to develop innovative solutions in the biometric domain. His expertise in this area has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Khaled has worked alongside talented colleagues, including John Paul Lesso and William E Sherwood. Their collaborative efforts contribute to the advancement of technology within their field.

Conclusion

Khaled Lakhdhar's contributions to biometric technology exemplify the impact of innovation in enhancing security and identification processes. His work continues to influence the development of advanced biometric systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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