Company Filing History:
Years Active: 2020-2024
Title: Kevin Wang - Innovator in Lithography Technologies
Introduction
Kevin Wang is a distinguished inventor located in Hsinchu, Taiwan. With a remarkable record of five patents to his name, he has significantly contributed to the field of lithography, primarily focusing on techniques that enhance the manufacturing processes of integrated circuits.
Latest Patents
One of Kevin's latest patents is centered around multiple-mask multiple-exposure lithography and masks. This patent presents innovative examples of a lithographic technique utilizing multiple masks, which allow for better precision in creating integrated circuit features. The photomask described in the patent incorporates a die area along with a stitching region. This stitch region is cleverly designed to include mask features for forming intricate circuit elements and also contains alignment marks to facilitate in-chip overlay measurements.
Career Highlights
Kevin Wang has made a name for himself at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading firm in the semiconductor industry. His work there has propelled advancements in lithography techniques, contributing to TSMC’s reputation as a pioneer in the domain.
Collaborations
Throughout his career, Kevin has collaborated with esteemed coworkers, including Peter Yu and Chih-Tung Hsu. These collaborations have fostered an environment of innovation and creativity, further enhancing the quality and scope of their collective work in lithography.
Conclusion
In summary, Kevin Wang is a notable innovator in the field of lithography, holding multiple patents that reflect his expertise and forward-thinking approach. His contributions at TSMC, along with fruitful collaborations, underscore his commitment to advancing technological boundaries and shaping the future of semiconductor manufacturing.