Rochester, NY, United States of America

Kevin P Nasman

This inventor holds 1 USPTO granted patent. Top assignee: Eni Technologies Inc.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin P Nasman. Retrieved from https://idiyas.com/inventor/kevin-p-nasman-4ryibnor

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 109(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Kevin P Nasman: Innovator in Plasma Process Control

Introduction

Kevin P Nasman is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of plasma process control, showcasing his expertise through his innovative patent.

Latest Patents

Kevin P Nasman holds a patent for a "Process detection system for plasma process." This invention involves a plasma process control arrangement that manages a plasma generator supplying electrical power to a plasma chamber for RF or DC plasma processes. The system includes a sensor that detects operating parameters such as voltage and current levels. The process detection system controller receives these parameters and utilizes a programmable memory unit to compute an output control signal. An external computer device allows users to create a control program tailored to specific process requirements, enhancing the efficiency of plasma processes.

Career Highlights

Kevin P Nasman is currently employed at Eni Technologies Inc., where he continues to develop innovative solutions in plasma technology. His work has positioned him as a key figure in advancing plasma process control systems.

Collaborations

Some of his notable coworkers include Daniel F Vona, Jr and Kevin S Gerrish, who contribute to the collaborative environment at Eni Technologies Inc.

Conclusion

Kevin P Nasman is a distinguished inventor whose work in plasma process control has made a significant impact in the field. His innovative patent reflects his commitment to advancing technology and improving process efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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