Location History:
- University of Leeds, GB (2008)
- Leeds, GB (2009)
Company Filing History:
Years Active: 2008-2009
Title: Kevin Critchley: Innovator in Photopatternable Monomolecular Films
Introduction
Kevin Critchley is a notable inventor based in Leeds, GB. He has made significant contributions to the field of materials science, particularly in the development of innovative photopatternable monomolecular films. With a total of 2 patents to his name, Critchley is recognized for his pioneering work in controlling solid-state properties through advanced molecular techniques.
Latest Patents
Critchley's latest patents include groundbreaking inventions such as UV decomposable molecules and a photopatternable monomolecular film formed therefrom. These inventions provide methods for controlling the solid-state properties of surfaces and forming reactive regions. The technology utilizes a device for ejecting droplets and molecules that can be photo-patterned using low-energy UV radiation. This innovative approach allows for the creation of monomolecular films that consist of hydrophobic and/or lipophobic structural components, which decompose under UV light to leave behind hydrophilic residues.
Career Highlights
Kevin Critchley is currently employed at Seiko Epson Corporation, where he continues to advance his research in photopatternable materials. His work has implications for various applications, including electronics and nanotechnology. Critchley's inventions not only enhance the understanding of molecular behavior under UV radiation but also provide practical solutions for patterning and controlling surface properties.
Collaborations
Throughout his career, Critchley has collaborated with esteemed colleagues such as Hitoshi Fukushima and Masaya Ishida. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of materials science.
Conclusion
Kevin Critchley stands out as a significant figure in the realm of innovative materials, with his patents paving the way for advancements in photopatternable technologies. His contributions continue to influence the scientific community and drive forward the potential applications of his inventions.