The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Aug. 09, 2004
Hitoshi Fukushima, Nagano-ken, JP;
Masaya Ishida, Nagano-ken, JP;
Stephen Evans, University of Leeds, GB;
Kevin Critchley, University of Leeds, GB;
Hitoshi Fukushima, Nagano-ken, JP;
Masaya Ishida, Nagano-ken, JP;
Stephen Evans, University of Leeds, GB;
Kevin Critchley, University of Leeds, GB;
Seiko Epson Corporation, Tokyo, JP;
Abstract
Aspects of the invention can provide a method of effectively observing the photodecomposition process of a monolayer in real time. The invention can provide a method of observing the decomposition process of a monolayer when the monolayer is irradiated with UV rays, where the structure of the constituent molecule of the monolayer in an ultrahigh vacuum atmosphere and an oxygen-containing atmosphere respectively can be measured by a molecular structure measuring device during the UV irradiation. The invention can also provide a method of controlling the degree of surface decomposition of the monolayer that controls the ozone concentration accompanying the UV irradiation based on observation results obtained by using the observation method. The invention can further provide a method of patterning the monolayer that employs the control method.