Keun-Young Park

Title: Keun-Young Park: Innovator in Substrate Cleaning Technologies

Introduction

Keun-Young Park is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate cleaning technologies, holding a total of 2 patents. His work focuses on developing innovative methods and apparatuses that enhance the efficiency and effectiveness of substrate cleaning processes.

Latest Patents

One of his latest patents is a "Method and apparatus for cleaning substrates." This invention provides an apparatus designed to clean and dry substrates by applying a variety of chemicals and gases. The apparatus features a substrate support member with a chuck that receives the substrate, a first nozzle member that injects a drying fluid onto the substrate's top surface, and a low cover that encloses the chuck. An upper cover selectively closes the opened top of the low cover, allowing for efficient drying in a controlled environment. This design not only improves the drying process but also protects the substrate from contamination by foreign pollutants and prevents the formation of undesired oxidation layers.

Another significant patent is the "Apparatus for supplying chemical liquid." This apparatus includes multiple nozzles that can be moved forward or backward to supply chemical liquid. It features a nozzle cover that accommodates the nozzles and has an open end for their movement. A nozzle driver is responsible for the forward and backward motion of each nozzle, enhancing the precision and control of chemical application.

Career Highlights

Keun-Young Park is currently employed at Semes Co., Ltd., where he continues to innovate and develop advanced cleaning technologies. His work has been instrumental in improving substrate cleaning processes, which are critical in various industries, including electronics and manufacturing.

Collaborations

Throughout his career, Keun-Young Park has collaborated with talented individuals such as Kyo-Woog Koo and Si-Eun Kim. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Keun-Young Park is a distinguished inventor whose work in substrate cleaning technologies has led to significant advancements in the field. His innovative patents reflect his commitment to enhancing efficiency and protecting substrates from contamination. His contributions continue to impact various industries positively.