Tokyo, Japan

Kesayoshi Amano


Average Co-Inventor Count = 3.6

ph-index = 7

Forward Citations = 253(Granted Patents)


Company Filing History:


Years Active: 1991-2000

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7 patents (USPTO):Explore Patents

Title: Kesayoshi Amano: Innovator in Mask Substrate Technology

Introduction

Kesayoshi Amano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of mask substrate technology. With a total of seven patents to his name, Amano's work has had a substantial impact on the efficiency and accuracy of circuit pattern transfers.

Latest Patents

Amano's latest patents focus on a mask substrate and a projection exposure apparatus equipped with the mask. These innovations aim to reduce mask pattern transfer errors caused by the expansion of the mask substrate during the transfer of circuit patterns onto photosensitive substrates. The mask substrate is designed to be loosely supported on multiple mounts on the mask stage, allowing it to expand freely in response to temperature changes. A measuring instrument, such as a temperature sensor or interferometer, is utilized to measure the expansion amount of the mask substrate. This data is crucial for adjusting the alignment and positioning of both the mask substrate and the photosensitive substrate based on the measured expansion.

Career Highlights

Kesayoshi Amano has built a successful career at Nikon Corporation, where he has been instrumental in advancing technologies related to photolithography. His innovative approaches have not only enhanced the precision of semiconductor manufacturing but have also contributed to the overall advancement of the industry.

Collaborations

Amano has collaborated with notable colleagues, including Ken Hattori and Yukio Kakizaki. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Kesayoshi Amano's contributions to mask substrate technology exemplify the importance of innovation in the semiconductor industry. His patents and collaborative efforts continue to shape the future of photolithography, ensuring greater accuracy and efficiency in circuit pattern transfers.

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