Location History:
- Tokyo, JP (1981)
- Yokohama, JP (1983)
Company Filing History:
Years Active: 1981-1983
Title: Kenyu Uema: Innovator in Electron Beam Technology
Introduction
Kenyu Uema is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 2 patents. His innovative work focuses on methods for detecting micro-marks on substrates, which are crucial in various technological applications.
Latest Patents
Kenyu Uema's latest patents include a method for detecting the position of a micro-mark on a substrate by using reflected electrons or secondary electrons. This method involves scanning a substrate with an electron beam and utilizing a pilot mark to determine the position of the micro-mark. The pilot mark is larger and has a predetermined relative position to the micro-mark, allowing for accurate detection. Another notable patent is for an electron beam exposure system that incorporates a basic pattern data memory and a central processing unit. This system efficiently determines the position of basic unit patterns on a wafer, enhancing the precision of electron beam exposure.
Career Highlights
Kenyu Uema is associated with Fujitsu Corporation, where he applies his expertise in electron beam technology. His work has been instrumental in advancing the capabilities of electron beam systems, making them more efficient and reliable for various applications.
Collaborations
Kenyu has collaborated with notable colleagues, including Kenichi Kawashima and Hiroshi Yasuda. Their combined efforts have contributed to the development of innovative technologies in their field.
Conclusion
Kenyu Uema's contributions to electron beam technology through his patents and work at Fujitsu Corporation highlight his role as a key innovator in the industry. His advancements continue to influence the technological landscape, showcasing the importance of innovation in modern applications.