Palo Alto, CA, United States of America

Kenton J Kwok

This inventor holds 1 USPTO granted patent. Top assignee: Carbon, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenton J Kwok. Retrieved from https://idiyas.com/inventor/kenton-j-kwok

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kenton J Kwok: Innovator in Additive Manufacturing

Introduction

Kenton J Kwok is a notable inventor based in Palo Alto, CA (US). He has made significant contributions to the field of additive manufacturing, particularly through his innovative patent that addresses the challenges of resin separation in 3D printing processes.

Latest Patents

Kenton holds a patent for a "Spin cleaning method and apparatus for additive manufacturing." This invention outlines a method for effectively separating excess resin from objects produced through stereolithography. The process involves several steps, including mounting objects on transfer frames, connecting them to a rotor, and using centrifugal force to remove excess resin while maintaining the integrity of the objects.

Career Highlights

Kenton is currently associated with Carbon, Inc., a company known for its advancements in 3D printing technology. His work at Carbon has positioned him as a key player in the development of innovative solutions for additive manufacturing.

Collaborations

Kenton collaborates with talented individuals such as Ananda Rose Day and William James Tucker, contributing to a dynamic team focused on pushing the boundaries of technology in their field.

Conclusion

Kenton J Kwok's contributions to additive manufacturing through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…