Shiojiri, Japan

Kento Nawa

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Seiko Epson Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kento Nawa. Retrieved from https://idiyas.com/inventor/kento-nawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Kento Nawa: Innovator in Liquid Discharge Technology

Introduction

Kento Nawa is a notable inventor based in Shiojiri, Japan. He has made significant contributions to the field of liquid discharge technology, holding 3 patents that showcase his innovative approach to engineering.

Latest Patents

Nawa's latest patents include a drive method of a liquid discharge apparatus and a liquid ejecting apparatus. The drive method involves a liquid discharge head that incorporates a nozzle, a pressure chamber, a piezoelectric element, a drive line, and a resistor. This method executes a non-printing process to prevent liquid discharge after a first printing process and before a second printing process. The liquid ejecting apparatus features a liquid ejecting head with nozzle arrays and a control section that manages the printing operation, allowing for efficient use of the nozzle arrays.

Career Highlights

Kento Nawa is currently employed at Seiko Epson Corporation, where he continues to develop innovative technologies in liquid discharge systems. His work has contributed to advancements in printing technology, enhancing the efficiency and effectiveness of liquid ejecting devices.

Collaborations

Nawa collaborates with talented coworkers, including Shigeki Suzuki and Tomohiro Matsubayashi, who share his passion for innovation and technology.

Conclusion

Kento Nawa's contributions to liquid discharge technology exemplify his dedication to innovation in engineering. His patents reflect a commitment to improving printing processes and advancing the capabilities of liquid ejecting apparatuses.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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