Company Filing History:
Years Active: 2018
Title: Kentarou Utsumi: Innovator in Sintered Oxide Technology
Introduction
Kentarou Utsumi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of sintered oxides used in sputtering targets. His innovative work aims to enhance the performance and reliability of these materials in high-power film-deposition processes.
Latest Patents
Utsumi holds a patent for a sintered oxide, method for its production, and sputtering target. The purpose of this invention is to provide a sintered oxide that minimizes abnormal discharge during high-power film-deposition while preventing cracking in the target. The sintered oxide comprises zinc, aluminum, titanium, and oxygen as its constituent elements. The atomic ratios of these elements are defined as Al/(Zn+Al+Ti)=0.035 to 0.050 and Ti/(Zn+Al+Ti)=0.05 to 0.20. Additionally, the average grain size of the crystal grains with a ZnTiO crystal phase in the sintered oxide is at most 5 µm.
Career Highlights
Kentarou Utsumi is currently employed at Tosoh Corporation, where he continues to advance his research and development efforts. His work has been instrumental in improving the quality and efficiency of sputtering targets, which are essential in various industrial applications.
Collaborations
Utsumi collaborates with several talented individuals, including Kenji Omi and Kenichi Itoh. Their combined expertise contributes to the innovative projects at Tosoh Corporation.
Conclusion
Kentarou Utsumi's contributions to the field of sintered oxides and sputtering targets highlight his role as a key innovator in materials science. His patent reflects a commitment to enhancing technology in high-power film-deposition processes.