Company Filing History:
Years Active: 2009-2014
Title: Kentarou Harada: Innovator in Radiation-Sensitive Resin Compositions
Introduction
Kentarou Harada is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of radiation-sensitive resin compositions. With a total of 2 patents, his work has been instrumental in advancing technologies used in lithography.
Latest Patents
Harada's latest patents include a novel fluorine-containing polymer and a purification method, as well as a radiation-sensitive resin composition. The fluorine-containing polymer is designed for liquid immersion lithography, providing excellent pattern shape and depth of focus. This innovation minimizes the elution of components in immersion liquids, such as water, enhancing the performance of the resist film. Additionally, his positive type radiation-sensitive resin composition is tailored for chemically-amplified resist applications, particularly sensitive to deep ultraviolet rays. This composition excels in process margins for various excimer lasers, showcasing Harada's expertise in the field.
Career Highlights
Kentarou Harada is associated with JSR Corporation, where he continues to push the boundaries of polymer research. His work has garnered attention for its practical applications in advanced lithography techniques, which are crucial for semiconductor manufacturing.
Collaborations
Harada collaborates with notable colleagues, including Hiroki Nakagawa and Hiromitsu Nakashima. Their combined efforts contribute to the innovative research environment at JSR Corporation.
Conclusion
Kentarou Harada's contributions to the field of radiation-sensitive resin compositions and fluorine-containing polymers highlight his role as a key innovator in polymer chemistry. His patents reflect a commitment to advancing technology in lithography, making a lasting impact on the industry.