Company Filing History:
Years Active: 2008-2023
Title: Kentarou Gotou: Innovator in Fluorine-Containing Polymers
Introduction
Kentarou Gotou is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of fluorine-containing polymers. With a total of 7 patents to his name, Gotou's work has had a substantial impact on liquid immersion lithography technologies.
Latest Patents
One of Gotou's latest patents focuses on a novel fluorine-containing polymer and its purification method. This invention aims to provide a radiation-sensitive resin composition that enhances the quality of patterns produced during liquid immersion lithography. The composition includes a fluorine-containing polymer that minimizes the elution of components in immersion liquids, such as water, during exposure. This innovation leads to improved pattern shape and depth of focus, as well as a larger receding contact angle between the resist film and the immersion liquid.
Career Highlights
Kentarou Gotou is currently associated with JSR Corporation, where he continues to advance research in polymer chemistry. His expertise in developing materials for lithography has positioned him as a key figure in the industry. His work not only contributes to technological advancements but also supports the growth of high-precision manufacturing processes.
Collaborations
Throughout his career, Gotou has collaborated with notable colleagues, including Hiroki Nakagawa and Hiromitsu Nakashima. These partnerships have fostered innovation and have been instrumental in the successful development of his patented technologies.
Conclusion
Kentarou Gotou's contributions to the field of fluorine-containing polymers and liquid immersion lithography exemplify the importance of innovation in modern technology. His ongoing work at JSR Corporation continues to push the boundaries of materials science, paving the way for future advancements.