Tokyo, Japan

Kentaro Oguchi

This inventor holds 1 USPTO granted patent. Top assignee: Sato Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kentaro Oguchi. Retrieved from https://idiyas.com/inventor/kentaro-oguchi-8g2qhjib

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kentaro Oguchi: Innovator in Label Technology

Introduction

Kentaro Oguchi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of label technology. His innovative approach has led to the development of a unique label structure that enhances usability and functionality.

Latest Patents

Kentaro Oguchi holds a patent for a label structure and label. This invention includes a base material with a print area where information is printed in a predetermined direction. The label structure also features an adhesive portion laminated on the back surface of the base material and a separator that covers the adhesive portion. The design incorporates a base material partition portion with a tear-off line and multiple intersections, enhancing the label's versatility.

Career Highlights

Kentaro Oguchi is associated with Sato Corporation, a company known for its innovations in labeling solutions. His work at Sato Corporation has allowed him to focus on developing advanced labeling technologies that meet the needs of various industries.

Collaborations

Kentaro collaborates with Yuko Saito, a fellow innovator in the field. Their partnership has fostered creativity and innovation in their projects.

Conclusion

Kentaro Oguchi's contributions to label technology exemplify his commitment to innovation. His patent for a unique label structure showcases his ability to address practical challenges in labeling.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…