Kentaro Ishii

Title: Kentaro Ishii: Innovator in Plasma Processing Technology

Introduction

Kentaro Ishii is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

Kentaro Ishii's latest patents include a method of etching a film and a plasma processing apparatus. This method involves etching a film on a substrate that includes an underlying region, the film itself, and a mask. The process consists of performing main etching on the film through plasma etching, which exposes part of the underlying region. Additionally, a protective layer is formed on the side wall surface of the mask after the main etching, using a material different from that of the film. The method also includes over-etching on the film after the protective layer is formed, which is again achieved through plasma etching.

Career Highlights

Kentaro Ishii is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of plasma processing.

Collaborations

Kentaro has collaborated with notable colleagues, including Kosuke Ogasawara and Seiji Ide, who share his commitment to innovation in the field.

Conclusion

Kentaro Ishii's contributions to plasma processing technology reflect his dedication to advancing the industry. His innovative methods and collaborative efforts continue to influence the field positively.