Tsukuba, Japan

Kenta Suzuki


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Ibaraki, JP (2019)
  • Tsukuba, JP (2020)

Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Kenta Suzuki: Innovator in Imprint Technology

Introduction

Kenta Suzuki is a prominent inventor based in Tsukuba, Japan. He has made significant contributions to the field of imprint technology, holding 2 patents that showcase his innovative approach to patterning techniques.

Latest Patents

One of his latest patents is an imprint device designed to enhance the efficiency of imprinting processes. This device features a supply mechanism that delivers multiple condensable gases with varying saturated vapor pressures. It effectively prevents resist filling failures caused by capillary condensation and allows for precise adjustments in pattern line width and shape using the same mold. Another notable patent is a method for forming micropatterns of polyimide. This method simplifies the patterning process and improves dimensional accuracy compared to traditional techniques like photolithography and laser processing. It utilizes a photosensitive, solvent-soluble polyimide resin composition that is moldable at temperatures below its glass-transition temperature.

Career Highlights

Kenta Suzuki is affiliated with the National Institute of Advanced Industrial Science and Technology, where he continues to push the boundaries of imprint technology. His work has garnered attention for its potential applications in various industries, including electronics and materials science.

Collaborations

He collaborates with esteemed colleagues such as Hiroshi Hiroshima and Sung Won Youn, contributing to a dynamic research environment that fosters innovation.

Conclusion

Kenta Suzuki's contributions to imprint technology reflect his dedication to advancing the field through innovative solutions. His patents not only demonstrate his expertise but also pave the way for future developments in patterning techniques.

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