Tokyo, Japan

Kenta Oono

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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10 patents (USPTO):Explore Patents

Title: Kenta Oono: Innovator in Generative Machine Learning

Introduction

Kenta Oono is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of generative machine learning, holding a total of 10 patents. His work focuses on developing advanced systems that enhance the understanding and processing of chemical compounds.

Latest Patents

One of Kenta Oono's latest patents is titled "Generative machine learning systems for generating structural information regarding chemical compound." This innovative computer system utilizes one or more memories and processors to generate structural information by inputting a latent representation into a generative model. The model is trained to minimize differences between structural information of various chemical compounds and their reconstructions. Another notable patent is the "Information processing device and information processing method," which describes a device that efficiently executes machine learning. This device includes an obtaining unit for source code, a storage unit for association relationships, and an executing unit that calculates output values based on input values during execution.

Career Highlights

Kenta Oono is currently employed at Preferred Networks, Inc., where he continues to push the boundaries of machine learning technology. His work has garnered attention for its potential applications in various industries, particularly in the field of chemistry.

Collaborations

Kenta collaborates with talented individuals such as Seiya Tokui and Yuya Unno, contributing to a dynamic and innovative work environment.

Conclusion

Kenta Oono's contributions to generative machine learning and his impressive portfolio of patents highlight his role as a leading inventor in the field. His work not only advances technology but also opens new avenues for research and application in chemical compounds.

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