Taipei, Taiwan

Kent Lu

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2002-2016

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3 patents (USPTO):Explore Patents

Title: Kent Lu: Innovating Stenography with Adjustable Keysets

Introduction

Kent Lu, an inventive mind based in Taipei, Taiwan, has made significant contributions to the field of stenography through his innovative designs. With a total of three patents, Lu's work focuses on enhancing usability and functionality in stenographic machines.

Latest Patents

Among his latest inventions is the "Adjustable Height Keyset for Stenographic Machine." This invention features a stenographic machine that includes a housing, a processing unit, and a keyboard that records dictations. The keyboard is equipped with a series of adjustable key assemblies pivotally connected to it. Each key assembly contains a key cap with a first removable securing portion, which cooperates with a second securing portion on the key lever. This design allows for adjustable positioning of the key cap, ensuring optimal comfort and efficiency for users. The key assemblies can move between a steady-state raised position and a depressed lowered position to suit the user's needs.

Career Highlights

Throughout his career, Kent Lu has worked with notable organizations, including Fellowes Manufacturing Company. His contributions have notably advanced the design and functionality of stenographic equipment, making it more accessible and effective for users.

Collaborations

During his career, Kent has collaborated with esteemed colleagues, including Greg Seely and Leonard J. Genest. These partnerships have fostered creativity and innovation, driving the development of cutting-edge stenographic solutions.

Conclusion

Kent Lu stands out as a pivotal inventor in the stenographic industry. His innovative designs, particularly the adjustable keyset, demonstrate his commitment to improving stenographic technology. As he continues to push the boundaries of invention, Lu's work may inspire future generations of inventors and users in the field.

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