Kent A Carey

Title: Kent A Carey: Innovator in Semiconductor Technology

Introduction

Kent A Carey is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to the diffusion of p-type dopants in III-V semiconductor layers. His work has implications for the efficiency and effectiveness of semiconductor devices.

Latest Patents

Kent A Carey holds a patent titled "Diffusion using a solid state source - Method for deposit of a p type dopant from a dopant layer into a predetermined region of a III-V semiconductor layer or multiple layers." This patent describes a method where a p-type dopant is deposited in high concentration adjacent to a predetermined region. A second semiconductor layer, doped with a lower concentration of an n-type dopant, is then deposited. This innovative approach allows for thermally driven diffusion of the p-type dopant into the predetermined region, which can be achieved at lower temperatures or shorter time intervals compared to conventional methods. This advancement enables p-type dopant diffusion to extend over greater distances, enhancing the performance of semiconductor devices.

Career Highlights

Kent A Carey is associated with Hewlett-Packard Company, where he has applied his expertise in semiconductor technology. His work at Hewlett-Packard has allowed him to contribute to various projects that leverage his innovative approaches to semiconductor fabrication.

Collaborations

Kent has collaborated with notable colleagues such as Thomas S Low and James S Chang. These collaborations have likely enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Kent A Carey is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patent demonstrates his commitment to improving semiconductor processes, which can have a lasting impact on technology.