Kenroh Kitamura

Title: Kenroh Kitamura: Dry-Developing Resist Innovations

Introduction

Kenroh Kitamura is an inventor associated with Fujisawa, Japan, and Fujitsu Corporation. His patent work includes two inventions focused on dry-developing resist compositions for forming patterns on substrates.

Latest Patents

Kitamura’s listed patents address positive and negative resist compositions that use gas plasma development.

The patent titled “Dry-developing resist composition” describes a positive resist made from a polymeric material containing specified reactive groups or halogen atoms, combined with a silicon compound. The disclosed process coats a substrate with the composition, exposes the resist layer to radiation, and develops the pattern using gas plasma.

“Dry-developing negative resist composition” describes a negative resist based on specified polymers or copolymers and a silicone compound. Its process involves coating a substrate, exposing the resist to ionizing radiation, applying a relief treatment, and developing the pattern with gas plasma.

Kitamura is credited with 2 patents.

Career Highlights

Kitamura’s patent portfolio reflects work on resist materials and plasma-based pattern development. These technologies are relevant to processes that create patterned layers on substrates.

Collaborations

Kitamura’s listed coworkers include Jiro Naito and Yasuhiro Yoneda. His company affiliation is Fujitsu Corporation.

Conclusion

Kenroh Kitamura’s two listed patents focus on positive and negative dry-developing resist compositions, highlighting his contributions to resist materials and gas-plasma patterning.