Kenric Cho

Title: Kenric Cho: Innovator in Atomic Layer Deposition Technologies

Introduction

Kenric Cho is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of materials science. He is recognized for his innovative work in atomic layer deposition (ALD) processes, particularly in the development of hafnium-containing high-K dielectric materials. His expertise and inventions have positioned him as a key figure in the semiconductor industry.

Latest Patents

Kenric Cho holds a patent titled "Methods for atomic layer deposition of hafnium-containing high-K dielectric materials." This patent outlines methods for depositing materials on substrates during vapor deposition processes, such as ALD. The invention describes a chamber that includes a substrate support and a chamber lid with an expanding channel formed within a thermally insulating material. The design allows for efficient gas flow through the expanding channel, enhancing the deposition process. This innovative approach is crucial for advancing semiconductor manufacturing technologies.

Career Highlights

Kenric Cho is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to collaborate with other talented professionals and contribute to cutting-edge technologies that drive the industry forward. His patent reflects his commitment to innovation and excellence in his field.

Collaborations

Throughout his career, Kenric has worked alongside talented colleagues, including Nyi O Myo and Shreyas Kher. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in the semiconductor sector.

Conclusion

Kenric Cho's contributions to atomic layer deposition technologies exemplify the spirit of innovation in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his role as a leading inventor in this critical field.