Rio Rancho, NM, United States of America

Kenneth P Bishop

This inventor holds 3 USPTO granted patents. Top assignees: The University of New Mexico, Other. Active years: 1982-1998.


% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 36(Granted Patents)


Location History:

  • Valley Stream, NY (US) (1982)
  • Rio Rancho, NM (US) (1997 - 1998)

Company Filing History:

goldMedal1 out of 942 
 
The University of New Mexico
 patents
silverMedal1 out of 834,350 
Other
 patents
where one patent can have more than one assignee

Years Active: 1982-1998

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3 patents (USPTO):Explore Patents

Title: Innovations of Kenneth P Bishop

Introduction

Kenneth P Bishop is a notable inventor based in Rio Rancho, NM (US). He has made significant contributions to the field of microelectronics, particularly in the area of photoresist technology. With a total of 3 patents, his work has advanced the methods used in evaluating and controlling exposure in lithographic processes.

Latest Patents

One of his latest patents is titled "Use of diffracted light from latent images in photoresist for optimizing." This invention includes a method and apparatus for the rapid, nondestructive evaluation of the contrast of a latent image in a photoresist. The contrast of the latent image is directly monitored by measuring the intensity of the light diffracted from a pattern in the exposed, undeveloped photoresist. The proper exposure tool parameters, such as exposure tool time and focus, are determined based on the intensity of different orders of diffracted light, particularly the 2nd-order diffracted from the latent image.

Another significant patent is "Diffracted light from latent images in photoresist for exposure control." This invention focuses on monitoring and controlling the exposure of an undeveloped photosensitive layer in microelectronics manufacturing. It involves ascertaining the intensities for one or more respective orders of diffracted power for an incident beam of radiation. This process ensures that a pattern with the desired critical dimension can be developed on the photosensitive layer.

Career Highlights

Kenneth has worked with various organizations, including the University of New Mexico. His experience in these institutions has allowed him to refine his expertise in the field of microelectronics and photoresist technology.

Collaborations

Throughout his career, Kenneth has collaborated with notable individuals such as S Sohail Naqvi and John R McNeil. These collaborations have contributed to the advancement of his research and innovations.

Conclusion

Kenneth P Bishop's contributions to the field of microelectronics through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, particularly in optimizing photoresist technology.

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