Middlefield, OH, United States of America

Kenneth I Hardee

This inventor holds 1 USPTO granted patent. Top assignee: Eltech Systems Corporation. Active years: 2007.


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations by Kenneth I Hardee

Introduction

Kenneth I Hardee is a notable inventor based in Middlefield, OH (US). He has made significant contributions to the field of electrochemistry, particularly in the development of coatings that inhibit undesirable oxidation in electrochemical cells. His innovative approach has the potential to enhance the efficiency of electroplating systems.

Latest Patents

Kenneth I Hardee holds 1 patent for his invention titled "Coatings for the inhibition of undesirable oxidation in an electrochemical cell." This patent describes a process for electroplating metal using a valve metal electrode substrate that contains multiple coating layers. The invention features a top coating layer of a valve metal oxide applied over a first coating layer of an electrochemically active coating. This electrode is particularly useful in electroplating systems that contain organic substituents, significantly reducing their consumption, or in systems where it is essential to suppress the oxidation of a species in an electrochemical cell.

Career Highlights

Kenneth I Hardee is associated with Eltech Systems Corporation, where he applies his expertise in electrochemistry to develop innovative solutions. His work at the company has contributed to advancements in electroplating technologies and has positioned him as a key figure in the industry.

Collaborations

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Conclusion

Kenneth I Hardee's contributions to the field of electrochemistry through his innovative patents and work at Eltech Systems Corporation highlight his role as a significant inventor. His advancements in coatings for electrochemical cells demonstrate the impact of his work on improving electroplating processes.

Profile summary based on public USPTO records.
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