Kenneth H Isaak

Title: Innovations of Kenneth H. Isaak

Introduction

Kenneth H. Isaak is a notable inventor based in Tustin, California. He has made significant contributions to the field of film thickness control in processing systems. His innovative approach has led to advancements in the precision of film deposition and etching processes.

Latest Patents

Isaak holds a patent for a "Method for film thickness endpoint control." This invention utilizes an ellipsometer to derive delta and psi coordinates from a polarized light beam reflected from a workpiece during processing. The measured film thickness is determined by these coordinates and other parameters. The method calculates the delta and psi coordinates of a selected endpoint, defining an unbounded line through the endpoint. As processing continues, an error is generated that becomes zero when the measured coordinates align with the defined line. This innovative control method enhances the accuracy of rapid thermal processing systems, allowing for temperature changes at rates of 100 degrees Celsius or more.

Career Highlights

Kenneth H. Isaak has worked with Tamarack Scientific Co. Inc., where he has applied his expertise in film thickness control. His work has contributed to the development of advanced processing systems that require precise control over film deposition and etching.

Collaborations

Isaak has collaborated with Chorng-Tao Yu, further enhancing the research and development efforts in their field.

Conclusion

Kenneth H. Isaak's contributions to film thickness control represent a significant advancement in processing technology. His innovative methods continue to influence the industry and improve the accuracy of thermal processing systems.