This inventor holds 34 USPTO granted patents, primarily in Filtration Technology. Top assignees: Cuno, Inc., Amf Gmbh, Other. Active years: 1981-2004.
Location History:
- San Antonio, TX (US) (1982 - 1987)
- South Glastonbury, CT (US) (1990)
- Glastonbury, CT (US) (1981 - 1991)
- S. Glastonbury, CT (US) (1987 - 1991)
- Monroe, CT (US) (1995 - 2004)
Company Filing History:
Years Active: 1981-2004
Areas of Expertise:
Title: Kenneth C. Hou: Innovator in Photoresist Technology
Introduction
Kenneth C. Hou, an accomplished inventor based in San Antonio, TX, has made significant contributions to the field of photoresist technology. With an impressive portfolio of 34 patents, his work primarily focuses on innovations that enhance the purity and efficiency of photoresist compositions used in various applications.
Latest Patents
Among his latest patents, Kenneth has developed a novel filter sheet designed for purifying photoresist composition. This filter sheet features a self-supporting fibrous matrix that has immobilized particulate filter aid and a particulate ion exchange resin. These components are uniformly distributed throughout the matrix's cross-section, ensuring effective removal of ionic impurities. The patented process for removing ionic impurities from a photoresist solution involves passing the solution through this filter sheet, showcasing Kenneth’s dedication to improving industry standards.
Career Highlights
Kenneth has had a distinguished career, with experience at notable companies such as Cuno, Inc. and AMF GmbH. His expertise in filtering and purification technologies has driven significant advancements in the field, leading to numerous successful patents that are widely recognized in the industry.
Collaborations
Throughout his impressive career, Kenneth C. Hou has collaborated with talented professionals, including coworkers Eugene A. Ostreicher and Joseph V. Fiore. These partnerships have fostered innovative ideas that have contributed to his successful patent applications and propelled advancements in photoresist technology.
Conclusion
Kenneth C. Hou stands out as a leading inventor in the realm of photoresist purification and filtration technologies. His substantial contributions, along with his effective collaborations and commitment to innovation, continue to influence the industry and inspire future advancements in the field.