Lakeland, MN, United States of America

Kenneth C Deutsch

This inventor holds 1 USPTO granted patent. Top assignee: Ethicon, Gmbh. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenneth C Deutsch. Retrieved from https://idiyas.com/inventor/kenneth-c-deutsch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Kenneth C. Deutsch

Introduction: Kenneth C. Deutsch, an accomplished inventor based in Lakeland, MN, has made significant contributions to the field of surgical technology. His inventive work has led to the patenting of a unique device that enhances surgical procedures.

Latest Patents: Kenneth holds a patent for the "Surgical Adhesion Barrier Applicator," which is designed to facilitate the application of surgical adhesion barriers effectively, reducing complications and improving patient outcomes.

Career Highlights: Deutsch is currently associated with Ethicon GmbH, a prominent company in the medical device industry. His work at Ethicon focuses on innovations that enhance surgical safety and efficiency, showcasing his commitment to advancing healthcare technology.

Collaborations: Throughout his career, Kenneth has collaborated with talented colleagues such as Mary B. Youtsler and Ronald D. Adams. Their collective expertise has contributed to the development of cutting-edge solutions in the surgical field, further emphasizing the importance of teamwork in innovation.

Conclusion: Kenneth C. Deutsch exemplifies the spirit of innovation within the medical device sector. His patent for the Surgical Adhesion Barrier Applicator not only reflects his ingenuity but also highlights the critical role inventors play in improving surgical practices and patient care.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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