Kenji Ueno

Title: Kenji Ueno: Innovator in Substrate Treatment Technology

Introduction

Kenji Ueno is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique method and apparatus for substrate spin treating.

Latest Patents

Kenji Ueno holds a patent for a "Substrate Spin Treating Method and Apparatus." This invention features a substrate supporting device that includes support elements for holding a substrate in place. The device is equipped with positioning elements that contact the outer peripheries of the substrate to monitor its horizontal movement. Additionally, a substrate sensor is integrated around the supporting device to detect the substrate being supported. Light projectors are also included to project light that overlaps in a plan view with the substrate, while light receivers capture the projected light. The signals from the substrate sensor and light receivers are processed by a microcomputer to determine if the substrate is correctly supported. The device can rotate the substrate about a vertical axis to perform predetermined treatments when it is confirmed to be correctly supported.

Career Highlights

Kenji Ueno is associated with Dainippon Screen Mfg. Co., Ltd., a company known for its advancements in manufacturing technology. His work has been instrumental in enhancing the efficiency and accuracy of substrate treatment processes.

Collaborations

Kenji Ueno has collaborated with Akihiko Morita, contributing to the development of innovative solutions in substrate technology.

Conclusion

Kenji Ueno's contributions to substrate treatment technology exemplify the impact of innovation in manufacturing processes. His patent reflects a commitment to improving the efficiency and reliability of substrate handling.