Hyogo, Japan

Kenji Teramoto

This inventor holds 1 USPTO granted patent. Top assignee: Kaneka Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Teramoto. Retrieved from https://idiyas.com/inventor/kenji-teramoto-xsa88g8k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kenji Teramoto: Innovator in Polymer Technology

Introduction

Kenji Teramoto is a distinguished inventor based in Hyogo, Japan. He has made significant contributions to the field of polymer technology, particularly in the development of materials that enhance the dispersibility of fine polymer particles.

Latest Patents

One of his notable patents is titled "Particulate and method for producing particulate." This invention provides a powdery and/or granular material that achieves excellent dispersibility of fine polymer particles in a matrix resin. The material contains specific fine polymer particles and a specific resin, featuring pores with an average diameter ranging from 0.03 μm to 1.00 μm. The total volume of these pores is not less than 0.0600 mL/g, showcasing the innovative nature of his work.

Career Highlights

Kenji Teramoto is associated with Kaneka Corporation, where he has been instrumental in advancing research and development in polymer materials. His expertise and innovative mindset have led to breakthroughs that benefit various applications in the industry.

Collaborations

He has collaborated with fellow inventor Nobuyoshi Maizuru, working together to push the boundaries of polymer technology and enhance the effectiveness of their inventions.

Conclusion

Kenji Teramoto's contributions to polymer technology through his innovative patents and collaborations highlight his role as a key figure in the field. His work continues to influence advancements in material science and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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