Ibaraki, Japan

Kenji Onishi

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Ibaraki, JP (2015)
  • Osaka, JP (2024)

Company Filing History:


Years Active: 2015-2024

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2 patents (USPTO):Explore Patents

Title: Kenji Onishi: Innovator in Semiconductor Technology

Introduction

Kenji Onishi is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on developing innovative materials and methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

Onishi's latest patents include a protective cover member and an adhesive film for semiconductor devices. The protective cover member is designed to be placed on the face of an object with an opening. It features a laminate that includes a protective membrane and a thermosetting adhesive layer. This design is particularly effective in reducing deformation and peeling during high-temperature treatments, such as reflow soldering. The adhesive film enables the manufacturing of high-quality semiconductor devices with improved yield ratios. It is specifically designed for embedding semiconductor elements and ensuring optimal connections through wire bonding or flip-chip bonding.

Career Highlights

Kenji Onishi is currently employed at Nitto Denko Corporation, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing the technology used in semiconductor manufacturing, contributing to the overall efficiency and effectiveness of the industry.

Collaborations

Onishi collaborates with talented coworkers, including Yuichiro Shishido and Sadahito Misumi. Together, they work on various projects that push the boundaries of semiconductor technology.

Conclusion

Kenji Onishi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced materials and methods in semiconductor manufacturing.

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